Influence of wet etching on the morphologies of Si patterned substrates and ZnO epilayers

Effects of Different Additive Gases on Dry Etching of SiC in SF_6

不同添加气体对SiC材料SF6干法刻蚀的影响

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A two dimensional infrared antireflection relief pattern was fabricated on a Si wafer, using ion beam etching process.

利用离子束刻蚀工艺技术，在Si片上制备了一种两维红外抗反射浮雕图案。

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Cl_2-Based Dry Etching of GaN Using Inductively Coupled Plasma

Cl2基气体感应耦合等离子体刻蚀GaN的工艺

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The novel methods include nano-imprint, laser interference lithography, x-ray lithography, electron beam lithography, focused ion beam and so on.

包括纳米压印、激光干涉光刻、x射线光刻、电子束光刻、聚焦离子束刻蚀等。

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Application of ICP Etching Technology in MEMS Field

ICP刻蚀技术在MEMS器件制作中的应用

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Research on Etching GaN 、 P-type Ohmic Contact and Fabrication of GaN LED

GaN的刻蚀、P型欧姆接触以及LED的研究

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Etching of multiplayer grating using a narrow spectral band X-ray

窄光谱带宽X射线刻蚀多层膜光栅

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The washer type bicrystal junction dc SQUID magnetometer was patterned using standard photolithography and ion-etching methods.

通过标准光刻和离子束刻蚀工艺制备出了高温超导垫圈型双晶结dc SQUID磁强计。

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Quantitative analysis of the separating rate of graphite was made in the process of iron's etching diamond.

对Fe刻蚀金刚石过程中石墨析出的速率进行了定量的研究。

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Study on the Compositions in the Interface of Corrosion Inhibition Membrane/ Copper Plating Layer/ Iron Substrate by Depth Etching and Photoelectron Spectroscopy

采用深度刻蚀与XPS能谱研究缓蚀膜/镀铜层/铁基体界面成分

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Exploration of Etch Process for SAW Devices with ZnO/ Glass Layered Structures

ZnO/玻璃层状结构SAW器件的刻蚀工艺探索

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Parameter Optimization Based on High-Aspect Ratio Si Dry Etching

基于高深宽比Si干法刻蚀参数优化

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A study on GaAs backside via hole etching technique

GaAs背面通孔刻蚀技术研究

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Study of etching performance of infrarad material Ge

红外材料Ge的刻蚀研究

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After resin embedding, frozen ultrathin slicing, and etching, the morphology of dispersed phase was observed by SEM.

分散相形态纺程演变：经树脂包埋、冷冻切片、刻蚀后，采用SEM观察分散相形态。

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The Absorption of CaO to Waste Gas from Plasma Etching by Emission Spectrometry

发射光谱法研究CaO对等离子体刻蚀废气的吸收作用

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The corrosion depth increases with the increasing number of scratching cycles.

刻蚀深度随刻划次数的增加而增大。

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Simulation of X-ray Lithography Mask Distortion during Back-etching

X射线光刻掩模背面刻蚀过程中的形变仿真

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Application of Cr Mask in Si Wet Etching

Cr掩模在硅湿法刻蚀中的应用研究

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Photolith and reactive ion etching techniques are used for grating fabrication on silicon nitride film. The equal light density Dammann grating with 65 × 65 spot arrays are fabricated successfully.

在氮化硅膜上进行光栅图形的光刻和反应离子刻蚀，成功研制出65×65等光强分束Dammann光栅。

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