vacuum deposition

Temperature of maximum weight loss could be decrease to 600 ℃ by grinding, vacuum heat treatment or slow deposition, but it will increased to 800 ℃ after nitrided;

磨削改性、真空热处理及慢沉积均使最大氧化失重温度点提前至600℃，而高温氮化则使最大失重点后移至800℃。

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The principle of ion assisted deposition technology in the vacuum deposition process is discussed.

讨论了离子束辅助沉积技术在真空沉积过程中的应用原理.

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Make use of magnetron sputtering, evaporation, vacuum vapor deposition, laser etching to prepare continuous or not continuous metal films also caused most interesting of the scholar.

而利用磁控溅射、热蒸镀、电化学沉积等方法制备的连续或者非连续金属膜衬底在表面增强荧光效应中也得到了广泛的应用。

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With the experiment of thin film deposition by vacuum evaporation techniques, a preliminary assumption that the Object-Oriented techniques could be applied in the visual simulation of materials design system has been put forward.

本文结合真空蒸发镀膜实验，提出了面向对象技术在实现可视化材料设计模拟系统中应用的初步设想。

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The cathode thin film of Ag 0.5V 2O 5 was fabricated using pulsed laser deposition ( PLD), and the metallic lithium anode thin film was prepared via vacuum thermal evaporation.

以脉冲激光沉积法（PLD）制备的非晶态Ag05V2O5薄膜为阴极，真空热蒸发法制备的金属锂为阳极，LiPON薄膜为电解质，成功地制备了一个新的Li/LiPON/Ag05V2O5全固态薄膜锂电池。

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Many processes are used to prepare transparent conductive films, such as magnetron sputtering, vacuum reactive evaporation, chemical vapor depositions, Sol-gel, laser-pulsed deposition.

多种工艺可以用来制备透明导电薄膜，如磁控溅射真空反应蒸发、化学气相沉积、溶胶-凝胶法以及脉冲激光沉积等。

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