Reactive Dynamics of Transition State of Si_4 and Si_3

1、

The Effect of the Mixture of Fine Structures on the Reactive Mechanism of High-lying State Cs and H_2

精细结构混合对高位态的Cs与H2的反应机制的影响

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2、

The burning course and speed of matter closely relates to its characteristics, reactive mechanism, its state and its environment.

物质的燃烧过程和速度与物质本身特性、反应机理、所处状态、环境密切相关。

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3、

Based on the mathematical model of three-phase PWM rectifier, which takes the DC voltage, active and reactive currents as state feedback variables, an inverse system of three-phase PWM rectifier is deduced and a pseudo linear system is constructed.

利用三相PWM整流器数学模型，以直流输出电压、有功和无功电流作为状态反馈变量，推导出三相PWM整流器的逆系统，并构造出伪线性系统。

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4、

Reactive power steady state security region

电力系统无功静态安全域

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5、

Results In the reactive repairing state of osteoarthrosis, the apoptosis cells mainly located in the superficial fibrous layer of articular cartilage.

结果关节盘损伤后软骨产生明显应激性修复增殖反应时，凋亡细胞主要集中于关节表面的纤维层中；

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6、

The police psychology stress is the reactive state of police physiology, psychology and action when police meet some cases related to the police affairs which are out of expect.

警察心理应激是指在警察自身预想之外出现的与警务活动有一定利害关系的事件而引起警察生理、心理和行为上的诸种变化的反应状态。

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7、

Growth of CeO_2 Buffer Layer Deposited with Reactive Sputtering

反应溅射法沉积氧化铈过渡层研究

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8、

Influence of Annealing on Electron Field Emission from AlN Films Prepared by RF Reactive Sputtering

热退火对射频反应溅射氮化铝薄膜场电子发射的影响

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9、

Plasma Emission Monitoring and TiO_2 Films Growth by Mid-Frequency Dual Magnetron Reactive Sputtering

等离子体发射监控系统参与的中频孪生反应磁控溅射沉积TiO2薄膜的实验研究

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10、

Study of ITO Transparent Conducting Thin Films Deposited by DC Magnetron Reactive Sputtering

直流磁控反应溅射沉积ITO透明导电膜的研究

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11、

Absorption property in visible region of TiO_2-xN_x films prepared by reactive sputtering

反应溅射TiO（2-x）N x膜的可见光吸收性能

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12、

Influence of Nitrogen Partial Pressure on Zirconium Nitride Films Grown by DC Reactive Sputtering

直流溅射中氮气分量对氮化锆薄膜性质的影响

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13、

Research for Technique of Large-area Indium-Tin Oxide Film by Magnetron Reactive Sputtering Method

磁控反应溅射制备大面积掺锡氧化铟薄膜工艺探讨

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14、

The Electrochromic Properties of Nickel Oxide Films Prepared by Magnetron reactive Sputtering

磁控反应溅射氧化镍薄膜电致变色特性的研究

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15、

Preparation and Properties of Al_2O_3 Barrier Layers for LCD by RF Reactive Sputtering

用于LCD的氧化铝阻挡层的射频反应溅射沉积及其特性

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16、

Structural analysis of SiCN film prepared by reactive sputtering

反应溅射Si-C-N薄膜的结构分析

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17、

Study on Sputtering Yield in Reactive Sputtering

反应溅射中的溅射产额研究

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18、

Growth Process of Preferential Orientation of AlN Thin Films by Magnetron Reactive Sputtering

磁控溅射氮化铝薄膜取向生长工艺研究

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19、

Hysteresis in Aluminum Oxides Films Growth with Pulsed Reactive Sputtering

铝靶脉冲反应溅射沉积氧化铝薄膜中的迟滞回线的研究

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20、

The Study of RF Reactive Sputtering SiO_2 Film

射频反应溅射SiO2薄膜的研究

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