We all have reasons for why we can't do something.

  • 当我们不能做某些事情时,我们都有很多理由。
  • 来源:互联网摘选更新时间:2026-07-13 07:26:57

  • 重点词汇
  • haveaux. 用以构成完成式及完成式的不定式,表示已经…;
  • doaux.构成疑问句和否定句;代替动词;用于加强语气;
  • reasonsn.理由( reason的名词复数 );原因;理性;理智;
  • for why(非正式)为什么;
  • can'tv.不能,不会;
  • alladj. 全部的;一切的;各种的;极度的,尽量的;
  • somethingpron.某物,某事;(表示不确切的描述或数量)大致,左右;想来重要(或值得注意)的事物;
  • wepron. 我们,咱们;笔者,本人;朕;人们;
  • 相关例句
1、

Health officials give other good reason for why children should play.

有关为什么儿童应该玩耍,卫生保健官员提出另一个好理由。

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2、

There is no one answer for why people dream.

对于人为什么做梦这个问题,没有确切的答案。

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3、

And if so, there's a pretty good explanation for why: Those nutrients all act as antioxidants.

如果真是这样,有一个很好的解释:这些营养素都是抗氧化剂。

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4、

As for why shaking hands was deemed a good method of greeting, rather than some other gesture, the most popular explanation is that it incapacitates the right hand, making it useless for weapon holding.

至于为什么握手被视为一种打招呼的好方法,而非其他,最普遍的解释是它占用了右手,让其无法持有武器。

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5、

That could be another explanation for why companies seem to be strengthening their talk of the practicality of their devices.

这也解释了为什么科技公司大谈其设备的实用性。

六级真题- 2016年 12月 1卷 信息匹配

6、

Steel samples were dissolved with nitric acid, hydrochloric acid and hydrofluoric acid by electrothermal heating or microwave digestion.

钢铁样品用硝酸、盐酸、氢氟酸在电热板上加热或微波消解,溶液经稀释后未经基体分离,未加内标直接用电感耦合等离子体质谱法(ICP-MS)测定。

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7、

After HF acid etching under 5 different HF concentrations and 6 exposing times, shear bonding strength of porcelain to enamel were tested.

选择30个氢氟酸(HF酸)浓度-时间搭配点,测试瓷贴面复合体整体粘结抗剪强度。

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8、

The effects of HF concentration, current density and light illumination on material formation were also discussed.

讨论了制备中氢氟酸(HF)浓度、电流密度和光照等因素对材料形成的影响。

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9、

Conclusion: The bond strength between IPS-Empress 2 dental ceramic and resin can reach the maximum when etching for 20 seconds.

结论:9.6%氢氟酸酸蚀20s能使IPS-Empress2陶瓷与树脂之间达到最大粘结强度。

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10、

Method: Healthy Wistar rats were randomly divided into four groups: hydrofluoric acid burn group, gasoline burn group A, gasoline burn group B, and normal control group, 18 rats in each group.

方法:健康大鼠随机分为氢氟酸烧伤组、汽油烧伤A组和B组、正常对照组。氢氟酸烧伤组致2%Ⅲ度烧伤。

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11、

The design of DCS in HF Alkylation unit, MTBE unit and Gas Separation unit is introduced.

介绍了氢氟酸烷基化装置、甲基叔丁基醚(MTBE)装置及气分装置等的DCS的设计。

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12、

We found that the detection sensitivity of the mouse IgG microarray was dependent on preparing conditions of porous silicon substrate including etching current density, etching time, and concentration of HF.

实验发现兔抗小鼠IgG抗体检测的灵敏度与多孔硅基底制备时所采用的腐蚀电流密度、腐蚀时间、氢氟酸浓度有关。

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13、

Determination of Iron Oxide and Alumina in Export Phosphorus Rock by ICP-AES of Dissolving Sample with Hydrofluoric Acid

氢氟酸溶样ICP-AES法测定出口磷矿石中氧化铁和氧化铝

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14、

The hydrofluoric acid-hydrochloric acid-nitric acid-vitriol ( HF-HCl-HNO_3-H_2SO_4) system was used for the determination of 15 rare earth elements in the ash of plant by inductively coupled plasma mass spectroscopy ( ICP-MS).

采用高温灰化植物样本,氢氟酸盐酸硝酸硫酸一次溶解植物灰分,电感耦合等离子体质谱法(ICP MS)同时测定15种稀土元素。

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15、

Ni-Mo type Hastelloy B alloy has good corrosion resistance in the hydrofluoric acid medium, but it is costly.

Ni Mo型的Hastelloy B合金用于氢氟酸介质中具有优良的耐蚀性能,但成本较高。

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16、

Harm of HF to human health and environment during the operation of HF alkylation units in PetroChina Dalian Petrochemical Company are summarized, the hazard and pollution source of HF are analyzed, and specific preventive measures are put forward.

综述中国石油某石化公司氢氟酸烷基化装置,在运行过程中HF对人身体和周边环境产生的危害,对HF的危险性和污染源做出分析并提出具体的预防措施。

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17、

In the presence of Al 2O 3 and HF, the ashing temperature is raised to 1600 ° C, where the interference of HF is expelled.

Al(NO3)3的存在,将铍的灰化温度提高到1600°C,且消除溶解所引入的大量剩余氢氟酸干扰。

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18、

The causes of HF corrosion were analyzed. The corrosion problem was solved after the application of electroless of Ni-P plating in the alkylation unit.

分析了氢氟酸腐蚀原因,把Ni-P化学镀用在烷基化装置上,从而解决了腐蚀问题。

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19、

The HP 4500 ICP-MS analysis of trace impurities in concentrated hydrofluoric acid used in semiconductor production was described.

研究了用HP4500型ICP-MS方法分析半导体用浓氢氟酸中的痕量杂质。

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20、

A basic model of sacrificial layer-phosphosilicate-glass ( PSG) etching was introduced, and Power law model was elucidated in details.

介绍了在硅微机械加工的牺牲层释放中,氢氟酸(HF)腐蚀磷硅玻璃(PSG)模型的建立过程,详细阐述了Power Law模型。

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