1、

The hardness of 45 steel through surface quenching with plasma reaches about 800 HV. Thus, the method of heat treatment using plasma as heat source is practical.

45号钢经等离子体表面淬火后,硬度在800HV左右,表明采用等离子体热源对工件进行热处理是可行的。

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2、

A Novel Pulse Plasma Light Source for CTCP Technology in Printing Industry

一种用于CTCP技术的新型脉冲等离子体光源

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3、

A Nitrogen Plasma Light Source Stimulated by RF Electrodeless Field Discharge for CTCP Technology in Printing

用于CTCP技术的射频无电极放电氮气等离子体光源研究

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4、

The simulation results have provided useful references for these problems such as thermal cathode primary electron emission, the determination of ion beam derivation area and the effective confinement of discharge plasma in the design of ion source.

计算结果对于离子源设计中的阴极热电子发射、离子束有效引出面积确定及等离子体的有效约束等重要问题有一定参考价值。

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5、

An argon ion source used for sputtering deposition has been successfully developed based on the construction of hollow cathode connecting hollow anode and the technologies of thermal cathode electron emission arc discharge, plasma magnetic confinement and ion extracting on a curving surface.

本文采用空心阴极空心阳极结构,用热阴极电子发射弧放电驱动并用磁场约束产生等离子体,用曲面发射引出离子束,研制成了氩气放电溅射离子源;

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6、

One of the two best fit models, which consists of a thermal plasma component and two absorbed power law components, indicates that the central hard X ray source must be significantly obscured and the observed spectrum is flatter than any earlier ones.

两套辐射模型均可很好拟和X谱,其一由一个热成分和两个吸收成分组成,表明中心核区必定被严重吸收、导致X谱变得平坦;

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7、

Heat source device with plasma arc quenching is of great capacity for its high thermal efficiency and low cost.

等离子弧淬火热源装置热效率高,成本低,有巨大的发展潜力。

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8、

The ablation property of hybrid C/ C composite at high temperature was investigated by the plasma torch as the thermal source.

利用等离子体火炬为高温热源,研究了混杂C/C复合材料的烧蚀性能。

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9、

High-frequency plasma ( HFP) as a high power and pure thermal source is used for producing ultra fine powder of sub-micron ZrO 2 and nano-meter ZnO by means of heat decomposition-condensation under high temperature in gas phase.

以高频等离子体(HFP)为高能、纯净热源,采用高温离解&气相冷凝沉积新工艺制备出亚微米级ZrO2及纳米级ZnO等超细粉体材料。

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10、

We think it is related to the fluctuations of the plasma density and the magnetic field of the source region in a small space scale.

我们认为这可能与小尺度空间内spike辐射源区的等离子体密度出现短时标的波动及磁场强度的起伏有关。

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11、

Fluorinated amorphous carbon films ( a C ∶ F) were deposited by microwave cyclotron resonance plasma chemical vapor deposition ( MWECR CVD) using benzene ( C 6H 6) and trifluoromethane ( CHF 3) as source gases.

用苯(C6H6)和三氟甲烷(CHF3)混合气体作源气体,采用永磁微波电子回旋共振等离子体化学气相沉积(MWECR CVD)技术,制备了氟化非晶碳膜(aC∶F)。

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12、

Amorphous fluorinated carbon(α C ∶ F) films with F/ C ratios between 0.11 and 0.62 are prepared by microwave electron cyclotron resonance plasma enhanced chemical vapor deposition using trifluoromethane ( CHF 3) and benzene ( C 6H 6) as source gases.

使用三氟甲烷和苯的混合气体,利用微波电子回旋共振等离子体增强化学气相沉积法制备了F/C比在011&062之间的αC∶F薄膜。

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13、

Analysis and calculate on electroacoustic efficiency of underwater plasma sound source system

水下等离子体声源系统效率分析与计算

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14、

A gas flow model with laser plasma as heat source was developed based on axial symmetric Euler equations in the laser propulsion rocket engine absorption chamber.

以轴对称非定常欧拉方程为基础,建立了激光推进火箭发动机吸收室内纯气相单组分、以激光等离子体为内热源的流场模型。

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15、

Plasma characteristics of an RF ion source were investigated by emission spectroscopy.

采用发射光谱法研究了高频离子源的等离子体性质。

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