cnx

X ray diffraction ( XRD) shows that CN x film samples have basically amorphous structure and very little amount of poly crystalline structures.

X射线衍射（XRD）结果显示CNx薄膜基本为无定形结构，但存在微量的多晶结构。

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The study of the CNx film structure by X-ray diffraction.

用直流磁控反应溅射方法，以陶瓷作为衬底，用X射线衍射方法，研究CNX薄膜的组织结构。

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CN x films were deposited on the Si ( 100 ) substrates with microwave plasma CVD method.

沉积在Si ( 100 ) 基片上的CNx膜是用微波等离子体化学气相沉积法(MWPCVD)制备的.

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The catalysis growth mechanism and morphologic structure of CNx nanotube are also discussed.

本论文还对CN x纳米管的催化生长机制，形貌结构特征进行了探讨。

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Recently, the electronic properties and cold cathode emission properties of CNx films attracted new attention.

近年来在电学性质和冷阴极电子场发射方面引起了关注。

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The study of carbon nitrogen bonds in the CNx film by FTIR.

用傅里叶变换红外光谱仪，研究CNX薄膜中C和N的键合情况。

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