magnetron的例句大全

Influence of Target Power Density on Ga-Doped ZnO Thin Films Prepared by Middle-Frequency Alternative Magnetron Sputtering

功率密度对中频磁控溅射制备的氧化锌镓薄膜性能的影响

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Some main contents and innovations in this paper are listed as follows: I. Copper nitride thin films were prepared by reactive radio-frequency magnetron sputtering of pure Cu target on glass substrates with various N2 flow rate.

主要内容和创新点如下：Ⅰ.以纯铜靶和氮气为原料，采用反应射频磁控溅射法在玻璃基底上成功制备了氮化铜纳米薄膜。

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ITO conductive films respectively with ITO target and In-Sn target were deposited on glass substrates by DC magnetron sputtering method.

采用直流磁控溅射法，分别用ITO陶瓷靶、In-Sn合金靶，在玻璃基片上镀膜。

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Study on Influence of Target Powers on Properties of Diamond-Like Carbon Films Deposited by Mid-Frequency Magnetron Sputtering System

中频磁控溅射制备类金刚石薄膜的功率因素研究

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Development and trend of transparent conductive thin films and target whose general property is perfect by magnetron-sputtering are summarized.

阐述用磁控溅射技术制备综合性能优良的ZAO透明导电薄膜及其靶材的发展现状和趋势。

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Study on movement of charged particles and etched profile on target surface during magnetron sputtering

磁控溅射带电粒子的运动分布以及靶面刻蚀形貌的研究

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C. Magnetron Sputtering in this paper. The TCR ( Temperature Coefficient of Resistance) of the films were less than 20 × 10-6/ ℃ using optimized deposition parameters, which were adjacent to the bulk material, realized the films of manganin pressure sensors.

根据薄膜理论和工艺实验，采用直流磁控溅射技术对薄膜沉积的工艺参数进行了优化，获得了电阻温度系数TCR≤20×10-6/℃的锰铜薄膜，与块材接近，实现了锰铜压力传感器的薄膜化。

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The microwave high temperature tube reactor consists of an anode power, a filament power, an electrical systems and a cooling system of the magnetron and the electrical components.

此外，该微波高温管式反应器还包含了阳极电源、灯丝电源、电气系统以及磁控管和电器元件的冷却系统。

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Co/ Cu/ FeNi three terminal device prepared by magnetron sputtering

磁控溅射制备Co/Cu/FeNi三端结器件

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Big Discovery: The magnetron worked even better on popcorn.

大发现：磁控管被用以制造微波炉，用它来做爆米花效果更好！

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The photoelectric property and thermoelectromotive force of CdIn_2O_4 or CIO thin film deposited by way of DC reactive magnetron sputtering process were investigated, as well as the effects of the O_2 concentration in reacting gas and annealing process on the property of CIO films.

研究了直流磁控反应溅射制备三元化合物CdIn2O4薄膜（简称CIO膜）的光电性质和温差电动势，及其反应气体中氧浓度和退火处理对CIO膜性质的影响。

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Computer Simulation of Thin Film Deposition by RF Magnetron Sputtering

射频磁控溅射沉积薄膜的计算机模拟

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The planar magnetron sputtering target for α-si: h thin film deposition

淀积α-Si：H薄膜的磁控靶

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Thin film deposition by ICP-enhanced nonequilibrium magnetron sputtering process For ICP AES analysis.

射频等离子体增强非平衡磁控溅射沉积技术分析过程冗长，不利于生产质控。

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Since magnetron sputtering is an extremely effective thin film deposition method of high-speed, low-temperature and low-damage, we deposit aluminum oxide films by RF reactive magnetron sputtering, and study their preparation and properties in theory and experiments.

鉴于磁控溅射作为一种高速、低温、低损伤的十分有效的薄膜沉积方法，我们选择射频反应磁控溅射法制备A1203薄膜，从理论和实验上研究了Al203薄膜的制备和性能。

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RF magnetron sputtering has been applied to SiO 2 deposition for a long time, but for economic mass production of film coating on large size its use is limited due to the higher cost and lower efficiency.

磁控溅射法制备SiO2膜传统上采用射频溅射工艺，但它成本较高，效率较低，无法充分满足大面积镀膜工业生产的需要。

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For stable operation of the magnetron, the preoscillation voltage should be lower than ehe threshold voltage, while the mode of this space charge oscillation should be the same as the π mode oscillation on the resonating cavities.

为了使磁控管能稳定工作，就要使预振电压低于门槛电压，并且使空间电荷振荡的模式与谐振腔上高频振荡的π模同步。

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Experiment and Design for Reducing the front Time Jitter of Coaxial Magnetron

降低同轴磁控管前沿抖动的实验与工程设计

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Through analysis we review methods fabricating thin film cathode, including chemical acetate base solution technique, sol-gel method, laser ablation, plasma enhanced chemical vapor deposition, pulsed laser deposition, radio frequency magnetron sputtering deposition, and electrostatic spray deposition.

评论了近年来制备薄膜阴极的方法，包括化学酸基溶解法、溶胶-凝胶法、激光焙烧法、增强型等离子体化学气相淀积法、脉冲激光法、电子束喷射沉积法和射频磁控溅射法。

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Effect of Target Current on Structure and Characteristics of the Hydrogen-free Carbon Films by Unbalanced Magnetron Sputtering

靶电流对非平衡磁控溅射制备无氢碳膜结构与性能的影响

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