1、

But the deposition rate and quality of a-Si: H was primarily affected by preparation methods.

但是a-Si:H的沉积速率和品质很大程度上受到制备工艺的影响。

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2、

study of the deposition rate of cobalt-nickel-phosphorus alloy

化学镀钴-镍-磷合金镀层沉积速度的探讨

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3、

Research on thin film deposition rate deposited by sputtering

溅射镀成膜速率的研究

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4、

When pH value < 0.5, faster deposition rate, faster growth rate of crystallizing nucleus, which causes bigger crystalline granularity and bad surface quality of the deposits such as crassitude or darkling.

pH<0.5时,沉积速度过快,晶核成长速度快,晶粒粒度较大,镀层表面粗糙、发黑,表面质量差。

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5、

The deposition rate is dropped as pressure in the reaction chamber is increased.

沉积速率随着反应室工作压力的增加而下降。

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6、

The dependence of the deposition rate on the laser intesity power has been obtained, at a given temperature, the threshold power is 4 W.

获得沉积速率对激光功率P的依赖关系,在一定的温度条件下,阈值功率为4W。

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7、

When the power is too high, ion bombardment effect results in the decrease of thin film deposition rate.

当功率过高时,离子的轰击作用导致薄膜的沉积速率降低。

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8、

On the contrary, deposition rate raise with mole fraction of MTS rising in mixed gas at higher temperature, whole reaction is controlled by mass transmission.

在较高温度下,反应速率随混合气体中MTS含量的增大而增大,总沉积速率受质量传输控制。

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9、

High deposition rate of a-Si ∶ H film is observed near by the substrate with high magnetic field gradient.

制备aSi∶H薄膜时,在衬底附近具有高的磁场梯度值可以得到高的沉积速率。

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10、

The process is stable, and the deposition rate can attain 4.5 mg/ ( cm2 · h).

该工艺稳定,沉积速度可达4.5mg/(cm2·h)。

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11、

The results showed that the Thiourea and Sodium acetate anhydrous concentration strongly affects the deposition rate and stability of the solution transformed and the following factors are Sodium hypophosphite, Lactic acid, Lead acetate and Nickel ion concentration in solution subsequently.

实验研究的结果显示,硫脲及无水乙酸钠浓度对转化镀液的沉积速度和稳定性都有显著的影响,影响作用次之的是次亚磷酸钠、乳酸、醋酸铅、镍离子的浓度。

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12、

The effects of reaction temperature and chloride concentration on the deposition rate of metal are also discussed.

同时还讨论了反应温度和氯化物浓度对金属沉积速度的影响。

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13、

Effect of Surface State after Activation on Deposition Rate of Direct Electroless Nickle Plating on Magnesium Alloy

镁合金直接化学镀镍活化表面状态对镀速的影响

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14、

KW microwave plasma chemical vapor deposition ( MP-CVD) of diamond film setup is developed successfully with a water-cooled stainless steel reaction chamber for large film square and higher deposition rate.

为提高微波等离子体化学气相沉积(MP-CVD)金刚石膜的面积和沉积速率,我们成功研制了5kW水冷不锈钢反应腔式MP-CVD装置。

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15、

In the low-rate nucleation stage, the deposition rate plays a role of controlling the morphological evolution and the lattice mismatch stress may be released in this stage.

第Ⅱ阶段属于低速率成核阶段,同时薄膜与基片之间的错配应力得以进一步释放;

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16、

After reburning fly ash to the particle deposition rate has been increased on the top wall and the front wall, reduced the particle deposition rate on the back wall and the influence to the arch can be ignored.

飞灰复燃提高了顶墙和前墙的颗粒沉积速率,降低了后墙颗粒沉积速率,而对锅炉前后拱的影响很小可以忽略。

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17、

The internal relations and mutual actions among the surfactants, the ( absorption) spectrum curve and copper deposition rate were studied.

探讨了表面活性剂和极性有机物、光谱曲线变化、沉铜速率3者之间的内在联系及相互作用机理。

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18、

feeding oxygen near the substrate is an efficient technology for depositing hard chromium oxide coatings at high deposition rate.

采用在基片附近局域供氧,可以实现高溅射速率下制备出高硬度的氧化铬薄膜。

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19、

The results show that when CH_4 is introduced into plasma, the deposition rate and C content of SiC/ C composite film increase, and films with columnar structure are formed.

研究结果表明,向等离子体中导入CH4,SiC/C薄膜沉积速度增大,薄膜中C含量增加,薄膜断面呈现柱状结构。

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20、

studies on deposition rate of electroless nickel-phosphorus alloy plating

化学镀镍磷合金镀速的研究

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