Two-Dimensional Thermal Analysis of Multi-Layer Pyroelectric Thin Film Infrared Detector

1、

Investigation on the High To Superconducting Thin Film Infrared Detector

高温超导薄膜红外探测器研究

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2、

Experimental results show that multilayers could smooth defects, but not enough for blank fabrication. Therefore, ion-assisted polishing should be employ during thin film deposition process.

实验结果表明，虽然多层膜对缺陷具有一定的平滑作用，但不能完全满足掩模白板的生产要求，必须在多层膜沉积过程中辅助以离子束抛光。

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3、

The Sol-Gel method is a technic which is convenient, cheap, and compatible with semiconductor technology and are widely used for BST thin film deposition.

溶胶&凝胶（Sol-Gel）法是比较适合制备BST薄膜的方便、廉价而与半导体工艺兼容的工艺。

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4、

The Bi_2Te_3 thin film deposition on Au substrate using electrochemical atomic layer epitaxy ( ECALE) is reported in this article.

采用电化学原子层外延法（ECALE）在Au电极上成功地制备了Bi2Te3化合物热电薄膜。

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5、

The fabrications are mainly based on semiconductor cleanroom facilities, which include thin film deposition, electron beam lithography, and etching.

这些工艺主要是基于超净室的一些设备，其中主要包括：薄膜沉积、电子束光刻、以及刻蚀。

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6、

Plasma enhanced chemical vapor deposition ( PECVD) is one of the matured and simple manipulated among the thin film deposition methods at low temperature.

等离子增强化学气相沉积（PECVD）是低温沉积硅膜的主要方法。

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7、

With these advantages, Microwave ECR plasma finds number of applications in the areas of etching technologies, thin film deposition and plasma source.

建立了ECR微波等离子体源离子输运的平板和圆柱模型，对离子历经的空间区域的输运过程进行了数值研究。

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8、

DOE's fabrication techniques mainly include laser beam or electron beam writing, RIE, ion milling and thin film deposition.

衍射光学元件的制作技术主要包括激光或电子束直写、反应离子刻蚀、离子束铣及薄膜沉积。

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9、

This thesis studies the organic thin film deposition method, in order to prepare thin films of a higher order organic thin film transistor.

本论文主要研究有机薄膜的蒸镀方法，以此来制备薄膜有序性较高的有机薄膜晶体管。

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10、

Third, the quality of thin film deposition and the length of time is not much impact, but will affect the surface morphology.

沉积时间长短对薄膜质量并没有太大影响，但会影响表面形貌。

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11、

Thin film deposition by ICP-enhanced nonequilibrium magnetron sputtering process For ICP AES analysis.

射频等离子体增强非平衡磁控溅射沉积技术分析过程冗长，不利于生产质控。

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12、

The iH pump is specially designed to cope with the harsh environment of thin film deposition process.

iH真空泵是特别为应付恶劣的薄膜工艺环境所设计。

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13、

Fresnel lens fabricated by thin film deposition

薄膜沉积法制作菲涅耳透镜

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14、

Finally, we verified the practicability of floating harmonic probe in the process of thin film deposition.

最后，对悬浮谐波探针的实用性进行了研究。

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15、

A manufacturing method for a light splitting grating based on precision ruling and thin film deposition technologies was presented.

给出了采用光栅刻划和镀膜技术相结合研制光盘分束光栅的方法。

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16、

The Bi_2Te_3 thin film deposition on Au substrate using electrochemical atomic layer epitaxy

Bi2Te3热电薄膜的电化学原子层外延制备

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17、

The planar magnetron sputtering target for α-si: h thin film deposition

淀积α-Si：H薄膜的磁控靶

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18、

When the power is too high, ion bombardment effect results in the decrease of thin film deposition rate.

当功率过高时，离子的轰击作用导致薄膜的沉积速率降低。

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19、

The thin film deposition can control precisely the height of the step and can obtain smooth surface.

薄膜沉积法具有精确控制台阶高度及台阶表面较光滑的优点。

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20、

Low Stress Silicon Nitride Thin Film Deposition by PECVD

低应力PECVD氮化硅薄膜的制备

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